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Table of Sputtering target

Table of Sputtering target

1.Target for optical film

Applications

  1. Low-Emissivity film for surface-treated glass for vehicle and building
  2. Films for displays and anti-reflective film for glass
  3. Optical adjustable film for touch panel (index matching film)
  4. Optical multi-layer film for glass for information electronics (mirrors of CD's and DVD's)
Material Product name Shape of target Target Film( in case of oxidation film)
Plate Cylinder DC Sputtering Characteristics Alkaline-resistant Acid-resistant Scratch resistance Others
Si type SC   Rapid film deposition (>crystal Si )
High strength Rapid film deposition、high thermal conductivity
n=1.46
Amorphous
Si thermal spray type Stable discharge n=1.46
Amorphous
Nb type NBO
Thermal spray
High strength Rapid film deposition
Rapid film deposition(>Nb)
n=2.3
Amorphous
Ti type TXO
Thermal spray
Rapid film deposition(>Ti) n=2.45
Amorphous

Characteristics

SC

  • Realizes long and stable electric discharge due to its properties of high strength, high thermal conductivity and homogeneous matrix.
  • Speed of deposition is higher more than 20% compared with that of crystal Si.
  • Amorphous SiO2 film is gained by oxidation-reactive sputtering.
  • Film gained by oxidation-reactive sputtering is non-colored with high transparency.

NBO

  • More than 3 times of higher deposition speed is possible with NBO compared with that of metal Nb.
  • Amorphous Nb2O5 film is gained by oxidation-reactive sputtering.
  • The film gained by oxidation-reactive sputtering is non-colored with high transparency.

TXO

  • More than 7 times of higher deposition speed is possible with TXO compared with that of metal Ti.
  • Amorphous TiO2 films are gained by oxidation-reactive sputtering.
  • The film gained by oxidation-reactive sputtering is non-colored with high transparency.

2.Target for high-durability protective film・Target for middle refraction rate film

Applications

  1. Protective film of surface-treated glass (colored glass, IR reflecting glass) for vehicle and housing.
  2. Anti-reflective film for films for displays (touch-panels and others).
  3. Protection film with scratch resistant for barcode-readers and glass of copy-machines
  4. Protective film for other various film requiring alkaline resistance and scratch resistance.
Material Product name Target shape Target Film( in case oxidation film)
Plate Cylinder DC Sputtering Characteristics Alkaline-resistant Acid-resistant Scratch resistant Others
Si type SX   High strength
Low arcing property
n=1.7
Amorphous
ST
Under development
High strength
Rapid film deposition(>SX)
n=1.7~2.0
Amorphous

Characteristic

SX

  • Amorphous film with flat and abrasion resistant generated by oxidation-reactive sputtering.
  • Film gained by oxidation-reactive sputtering is non-colored and with high transparency.
  • Film gained by oxidation-reactive sputtering is excellent in resistance to scratch and chemicals.

ST

  • Deposition speed is possible comparison to the SX.
  • Amorphous film generated by oxidation-reactive sputtering is flat and abrasion resistant.
  • Film gained by oxidation-reactive sputtering is non-colored and with high transparency.
  • Film gained by oxidation-reactive sputtering is excellent in resistance to scratch and chemicals.
  • Film gained by oxidation-reactivity sputtering is anti-drop property.
  • Refractive index of film is adjustable from “1.7” to "2.0" by varying the composition of target.

3.Target for dielectric film for Low-E・Target for middle refraction rate film

Application

  1. Dielectric film for Low-E (Low-Emissivity) for building material
  2. Optical middle refraction rate film for anti-reflective film and so on
Material Product name Target shape Target Film quality
Plate Cylinder DC Deposition Characteristics
Zn type SZ Alloy Target
Ar deposition
n=2.0
Amorphous
AZ
Under development
Alloy Target
Ar deposition
n=2.0
Amorphous

Characteristic

  1. Cylinder SZ target developed by our own method (RP method: Patent applied for) realized high adhesive strength with the backing tube. Therefore, with high power sputtering, rapid deposition higher than that of conventional thermal spray method is possible.
  2. Long size of cylinder shape, with more than 3m in length, is possible to produce.

4.Target for transparent conductive film

Application

  1. Transparent electrode for glass for environment and energy purposes (such as solar cell)
  2. Transparent electrode for glass for displays (PDP, LCD)
  3. Transparent conductive film for glass for vehicle and building (such as heat ray reflection glass, heat generating surface of electric car)
  4. Anti-static coating film for fibers and films
Material Product name Target shape Target Film quality
Plate Cylinder DC deposition Characteristics Conductivity Chemical-resistance Other characteristics
Zn type GZO   High density sintered ceramics
Ar deposition
× n=1.9
Low temperature crystal film
AZO
Under development
High density sintered ceramics
Ar deposition
× n=1.9
Low temperature crystal film

Characteristic

  1. High density ZnO type target with more than 90% of relative density.
  2. Compared with ITO, nodules are less possible to generate, and a stable electric discharge is possible.
  3. Deposition in pure argon atmosphere is possible.
  4. Crystal film formation is possible to gain even at room temperature.

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